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Preparation and characterization of CrVN thin films deposited by reactive dc magmetron co-sputtering | Unchit | งดใช้ระบบ 3-31 กค 66 Burapha Science Journal

Preparation and characterization of CrVN thin films deposited by reactive dc magmetron co-sputtering

Sitthiwat Unchit, Surasing Chaiyakun, Adisorn Buranawong

Abstract


Chromium vanadium nitride (CrVN) thin film was deposited by reactive DC magnetron co-sputtering method on glass slide and silicon. The effect of vanadium sputtering current (IV) on the crystal structure, surface morphology and thickness of thin film were investigated by XRD and AFM techniques, respectively. The result show that the influence of vanadium sputtering current has dominate the crystal structure , surface morphology and thickness of thin film. The as-deposited films were compose of CrVN with (111), (200), (220) planes. The roughness and thickness of the as-deposited films were in the range of 883 to 1048 nm and 3.75 to 4.96 nm, respectively.


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